25th European Mask and Lithography Conference (12-15 January 2009, Dresden, Germany)Behringer, Uwe F. W.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7470, issn 0277-786X, isbn 978-0-8194-7770-5 0-8194-7770-2, 1Vol, various pagings, isbn 978-0-8194-7770-5 0-8194-7770-2Conference Proceedings

Resolution capability of EBM-6000 and EBM-7000 for Nano-imprint templateYOSHITAKE, S; KAMIKUBO, T.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7470, issn 0277-786X, isbn 978-0-8194-7770-5 0-8194-7770-2, 1Vol, 74700H.1-74700H.7Conference Paper

Nanoimprint lithography techniques : an introductionSCHEER, H.-C.Proceedings of SPIE, the International Society for Optical Engineering. 2006, pp 62810N.1-62810N.10, issn 0277-786X, isbn 0-8194-6356-6, 1VolConference Paper

The status of LEEPL : Can it be an alternative solution?UTSUMI, Takao.Proceedings of SPIE, the International Society for Optical Engineering. 2006, pp 628102.1-628102.13, issn 0277-786X, isbn 0-8194-6356-6, 1VolConference Paper

Mask Industry Assessment Trend AnalysisHUGHES, Greg; YUN, Henry.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7470, issn 0277-786X, isbn 978-0-8194-7770-5 0-8194-7770-2, 1Vol, 747003.1-747003.11Conference Paper

Mask salvage in the age of capital contractionKIMMEL, Kurt R.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7470, issn 0277-786X, isbn 978-0-8194-7770-5 0-8194-7770-2, 1Vol, 747004.1-747004.6Conference Paper

Programmable Lab-on-a-Chip System for single cell analysisTHALHAMMER, S.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7364, issn 0277-786X, isbn 978-0-8194-7638-8 0-8194-7638-2, 1Vol, 73640B.1-73640B.15Conference Paper

EMLC 2008 (24th European Mask and Lithography Conference)Behringer, Uwe F.W; Maurer, Wilhelm; Waelpoel, Jacques et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, issn 0277-786X, isbn 978-0-8194-6956-4, 1 v. (various pagings), isbn 978-0-8194-6956-4Conference Proceedings

Nanotechnology IV (4-6 May 2009, Dresden, Germany)Wixforth, Achim; Lorke, Axel; Simmel, Friedrich C et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7364, issn 0277-786X, isbn 978-0-8194-7638-8 0-8194-7638-2, 1Vol, various pagings, isbn 978-0-8194-7638-8 0-8194-7638-2Conference Proceedings

EMLC 2007 (23rd European Mask and Lithography Conference)Behringer, Uwe F.W; Maurer, Wilhelm; Waelpoel, Jacques et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, issn 0277-786X, isbn 978-0-8194-6655-6, 1 v. (various pagings), isbn 978-0-8194-6655-6Conference Proceedings

The task of EUV-reflectometry for HVM of EUV-masks: first stepsFARAHZADI, Azadeh; WIES, Christian; LEBERT, Rainer et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7470, issn 0277-786X, isbn 978-0-8194-7770-5 0-8194-7770-2, 1Vol, 74700E.1-74700E.7Conference Paper

Extended Abbe approach for fast and accurate lithography imaging simulationsEVANSCHITZKY, P; ERDMANN, A; FÜHNER, T et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7470, issn 0277-786X, isbn 978-0-8194-7770-5 0-8194-7770-2, 1Vol, 747007.1-747007.11Conference Paper

MeRiT^® repair verification using in-die phase metrology Phame^® BUTTGEREIT, Ute; BIRKNER, Robert; STELZNER, Robert et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7470, issn 0277-786X, isbn 978-0-8194-7770-5 0-8194-7770-2, 1Vol, 747016.1-747016.7Conference Paper

Particle transport and reattachment on a mask surfaceNESLADEK, Pavel; OSBORNE, Steve; KOHL, Christian et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7470, issn 0277-786X, isbn 978-0-8194-7770-5 0-8194-7770-2, 1Vol, 74700B.1-74700B.11Conference Paper

Bioengineered and bioinspired systems IV (4-6 May 2009, Dresden, Germany)Rodríguez-Vázquez, Angel; Carmona-Galán, Ricardo A; Liñán-Cembrano, Gustavo et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7365, issn 0277-786X, isbn 978-0-8194-7639-5 0-8194-7639-0, 1Vol, various pagings, isbn 978-0-8194-7639-5 0-8194-7639-0Conference Proceedings

Dynamic OSR Sigma Delta Controller for Monolithic Switching ConvertersCONTI, M; ORCIONI, S; D'APARO, R et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7363, issn 0277-786X, isbn 978-0-8194-7637-1 0-8194-7637-4, 1Vol, 73630W.1-73630W.11Conference Paper

Mesoscale honeycomb films for templating inorganic nanomaterials and microspheresKON, K; KARTHAUS, O.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7364, issn 0277-786X, isbn 978-0-8194-7638-8 0-8194-7638-2, 1Vol, 73640K.1-73640K.8Conference Paper

Desired IP Control methodology for EUV Mask in Current Mask ProcessYOSHITAKE, S; SUNAOSHI, H; TAMAMUSHI, S et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 67920T.1-67920T.11, issn 0277-786X, isbn 978-0-8194-6956-4Conference Paper

Inspection results of advanced (sub-50nm design rule) reticles using the TeraScanHRSIER, Jean-Paul; BROADBENT, William; YU, Paul et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 67920I.1-67920I.13, issn 0277-786X, isbn 978-0-8194-6956-4Conference Paper

Mask Data Rank (MDR) and its ApplicationKATO, Kokoro; ENDO, Masakazu; INOUE, Tadao et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 679209.1-679209.8, issn 0277-786X, isbn 978-0-8194-6956-4Conference Paper

Effects of heat curing on adhesive strength between microsized SU-8 and Si substrateISHIYAMA, C; SONE, M; HIGO, Y et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65331F.1-65331F.8, issn 0277-786X, isbn 978-0-8194-6655-6Conference Paper

Consequences of plasmonic effects in photomasksSCHELLENBERG, F. M; ADAM, K; MATTEO, J et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, pp 62810B.1-62810B.10, issn 0277-786X, isbn 0-8194-6356-6, 1VolConference Paper

Plasma deposited and evaporated thin resists for template fabricationLAVALLEE, Eric; BEAUVAIS, Jacques; TAKAM MANGOUA, Bertrand et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, pp 62810O.1-62810O.6, issn 0277-786X, isbn 0-8194-6356-6, 1VolConference Paper

Electron beam inspection methods for imprint lithography at 32 nmSELINIDIS, Kosta; THOMPSON, Ecron; SREENIVASAN, S. V et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7470, issn 0277-786X, isbn 978-0-8194-7770-5 0-8194-7770-2, 1Vol, 74700I.1-74700I.9Conference Paper

Assessment and application of focus drilling for DRAM contact hole fabricationNOELSCHER, Christoph; JAUZION-GRAVEROLLE, Franck; HENKEL, Thomas et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 67920Q.1-67920Q.10, issn 0277-786X, isbn 978-0-8194-6956-4Conference Paper